High-Resolution OES Solutions for Semiconductor Process Control
Avantes delivers advanced Optical Emission Spectroscopy (OES) solutionsdesigned to meet the demanding requirements of semiconductor manufacturing. Our high-resolution, modular spectrometers enable real-time analysis of plasma composition, helping manufacturers optimize etching, deposition, and other critical fabrication steps. With flexible integration and multichannel capabilities, Avantes systems provide reliable, in-situ diagnostics for improved yield, process control, and contamination detection.
Customer Success Story:
Semiconductor Plasma Process Monitoring
Explore real-world scenarios where Avantes’ Plasma Optical Emission Spectroscopy (OES) instruments deliver accurate, real-time plasma monitoring during thin film and optical coating processes.
Demonstration Scenario: Plasma OES for Optical Coating Processes
Industry: Semiconductor Manufacturing
Application Need:
A semiconductor equipment manufacturer sought a reliable method to monitor plasma processes and accurately detect process endpoints during fabrication. Precise plasma monitoring is essential to maintain product quality and optimize manufacturing efficiency.
Solution:
Avantes supplied a broadband spectrometer system combined with fiber optic probes installed through chamber viewports. This configuration allowed for real-time, non-intrusive monitoring of plasma emissions during processing. The system provided continuous spectral data, enabling detection of key plasma characteristics and changes that signal process completion. Its broad spectral range and high sensitivity supported diverse plasma chemistries and process conditions
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